DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 237-240
- https://doi.org/10.1016/s0167-9317(98)00054-9
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Lithography with high depth of focus by an ion projection systemJournal of Microelectromechanical Systems, 1992