Growth and Size Control of Amorphous Silicon Quantum Dots Using SiH4/N2 Plasma
- 25 November 2002
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 8 (6), 254-256
- https://doi.org/10.1002/1521-3862(20021203)8:6<254::aid-cvde254>3.0.co;2-s