Abstract
Boron trifiuoride does not form a stable adduct with hexamethyldigermoxane. Instead, cleavage of the Ge—O—Ge linkage occurs with quantitative formation of trimethylfluorogermane and boron trioxide. Trimethylmethoxygermane and boron trifiuoride form a 1:1 addition compound which sublimes without decomposition. Dative dπ–pπ bonding, if present in the Ge—O linkage of trimethylmethoxygermane, does not appear to affect appreciably the electron-donor activity of the oxygen atom toward boron trifiuoride. The preparation and some properties of CH3GeH2Br, CH3GeHCl2, (CH3)3GeCl, (CH3)3GeF, [(CH3)3Ge]2O, and (CH3)3GeOCH3 are described.