Laser photodeposition of refractory metals

Abstract

We report the deposition of the refractory metals chromium,molybdenum, and tungsten through the laser‐induced gas‐phase photolysis of their respective hexacarbonyls. A copper, hollow cathode laser was used at ultraviolet wavelengths matched to peaks in the absorption spectra of the carbonyl molecules. Localized room‐temperature metal deposition was achieved by focusing the beam into a cell containing the carbonyl gas and helium as a buffer. No major differences were noted for deposition on a polished silicon wafer, a thermally oxidizedsilicon wafer, and a quartz flat.