First principles study of adsorbed Cun (n=1–4) microclusters on MgO(100): Structural and electronic properties

Abstract
We present a density functional study of the structural and electronic properties of small Cun (n=1,4) aggregates on defect-free MgO(100). The calculations employ a slab geometry with periodic boundary conditions, supercells with up to 76 atoms, and include full relaxation of the surface layer and of all adsorbed atoms. The preferred adsorption site for a single Cu adatom is on top of an oxygen atom. The adsorption energy and Cu–O distance are ES−A=0.99 eV and dS−A=2.04 Å using the Perdew–Wang gradient corrected exchange correlation functional. The saddle point for surface diffusion is at the “hollow” site, with a diffusion barrier of around 0.45 eV. For the adsorbed copper dimer, two geometries, one parallel and one perpendicular to the surface, are very close in energy. For the adsorbed Cu3, a linear configuration is preferred to the triangular geometry. As for the tetramer, the most stable adsorbed geometry for Cu4 is a rhombus. The adsorption energy per Cu atom decreases with increasing the size of the cluster, while the Cu–Cu cohesive energy increases, rapidly becoming more important than the adsorption energy.
All Related Versions