A novel plasma reactor for NO/sub x/ control using photocatalyst and hydrogen peroxide injection
- 1 January 1999
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Industry Applications
- Vol. 35 (6), 1306-1310
- https://doi.org/10.1109/28.806043
Abstract
No abstract availableKeywords
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