Computational study of the effect of Al and In on the formation energies and acceptor levels of Mg and C dopants in GaN
- 20 September 2001
- journal article
- Published by IOP Publishing in Journal of Physics: Condensed Matter
- Vol. 13 (40), 8875-8880
- https://doi.org/10.1088/0953-8984/13/40/301
Abstract
The effect of aluminium and indium on the formation energies and acceptor levels of magnesium and carbon dopants in GaN have been calculated using a density functional approach. Single aluminium and indium atoms are incorporated into the lattice at a minimal distance from the acceptor species. The formation energies are obtained as a function of the position of the Fermi level. In the absence of aluminium or indium, magnesium in a charge neutral state is found to have a formation energy of 1.1 eV, whereas carbon has a formation energy of 2.6 eV. In the presence of indium, the magnesium formation energy rises to 1.4 eV, whereas the addition of aluminium has no effect. For carbon, the presence of aluminium and indium increases the formation energy by 0.4 and 0.3 eV, respectively. Furthermore, the calculations predict that the magnesium acceptor level becomes more shallow by the addition of aluminium (from 0.14 to 0.01 eV above the valence band maximum), but is made deeper by indium (from 0.14 to 0.27 eV above the valence band maximum). The carbon acceptor level is found to remain approximately unchanged with aluminium and indium doping. These results are compared to experimental data and the effect of various approximations in the calculations is discussed.Keywords
This publication has 17 references indexed in Scilit:
- Electrical characterization of Mg-related energy levels and the compensation mechanism in GaN:MgPhysica B: Condensed Matter, 1999
- Enhanced Mg doping efficiency in Al0.2Ga0.8N/GaN superlatticesApplied Physics Letters, 1999
- Deep electronic gap levels induced by isovalent P and As impurities in GaNPhysical Review B, 1998
- Nature of the 2.8 eV photoluminescence band in Mg doped GaNApplied Physics Letters, 1998
- Enhancement of deep acceptor activation in semiconductors by superlattice dopingApplied Physics Letters, 1996
- Native defects and impurities in GaNPublished by Springer Nature ,1996
- Compensation of-Type Doping in ZnSe: The Role of Impurity-Native Defect ComplexesPhysical Review Letters, 1995
- Acceptor binding energy in GaN and related alloysSemiconductor Science and Technology, 1995
- p-type gallium nitride by reactive ion-beam molecular beam epitaxy with ion implantation, diffusion, or coevaporation of MgApplied Physics Letters, 1994
- Iterative minimization techniques forab initiototal-energy calculations: molecular dynamics and conjugate gradientsReviews of Modern Physics, 1992