Atomic configuration of hydrogenated and clean Si(110) surfaces

Abstract
Step structure models for hydrogenated and clean Si(110) surfaces are proposed by kinematical analysis of low-energy electron diffraction patterns. The step structures are described as periodically up and down sequence of terraces with [1¯ 1¯ 2] step boundaries and the step height is within ±5% of the bulk Si(110) layer spacing. The number of Si atoms on each terrace along a [110] direction is 8±1.