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Properties of Insulating Thin Films Deposited by RF Sputtering
Home
Publications
Properties of Insulating Thin Films Deposited by RF Sputtering
Properties of Insulating Thin Films Deposited by RF Sputtering
WP
W. A. Pliskin
W. A. Pliskin
PD
P. D. Davidse
P. D. Davidse
HL
H. S. Lehman
H. S. Lehman
LM
L. I. Maissel
L. I. Maissel
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1 July 1967
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 11
(4)
,
461-467
https://doi.org/10.1147/rd.114.0461
Abstract
No abstract available
Cited by 32 articles