Analysis of neutral fragments from ultraviolet laser irradiation of a photolabile triazeno polymer
- 24 November 1999
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (12), 7116-7122
- https://doi.org/10.1063/1.371800
Abstract
A photolabile triazeno polymer was irradiated with pulsed excimer laser light at 248 nm and 30 ns pulse width. The ablation fragments were analyzed using time-of-flight (TOF) mass spectrometry. At fluences below 1.3 only neutral products were found. At these fluences, is by far the most intense neutral signal along with measurable phenyl radical (mass 76) production. The TOF shows a fast shoulder corresponding to kinetic energies of about 1.1 eV and a long slow tail persisting for hundreds of microseconds. The tail is attributed to delayed emission of reaction products from the polymer. The kinetic energy of the fast peak is attributed to direct ejection of products from surface sites undergoing exothermic decomposition. A weaker signal due to the phenyl radical is also observed. The observed fluence dependence of the two major products is highly nonlinear and is shown to fit an Arrhenius equation. We discuss the implications of these measurements regarding photochemical versus photothermal processes.
Keywords
This publication has 24 references indexed in Scilit:
- Dopant induced ablation of poly(methyl methacrylate) at 308 nmJournal of Applied Physics, 1999
- Incubation and Photoablation of Poly(methyl methacrylate) at 248 nm. New Insight into the Reaction Mechanism Using Photofragment Translational SpectroscopyThe Journal of Physical Chemistry A, 1997
- Laser-induced emission of neutral atoms and molecules from electron-irradiated NaNO 3Applied Surface Science, 1996
- Laser ablation: Selective unzipping of addition polymersApplied Physics Letters, 1996
- Laser Initiation of the Decomposition of Energetic Polymers: Shock Wave FormationThe Journal of Physical Chemistry, 1995
- Multiphoton Ionization-Mass Spectrometric Study on Laser Ablation of Polymethylmethacrylate and Polystyrene at 308 nmJapanese Journal of Applied Physics, 1995
- Photolysis of 1-aryl-3,3-dialkytriazenesJournal of Photochemistry and Photobiology A: Chemistry, 1994
- Excimer laser ablation of novel triazene polymers: influence of structural parameters on the ablation characteristicsThe Journal of Physical Chemistry, 1993
- Ultraviolet laser ablation of organic polymersChemical Reviews, 1989
- Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nmMacromolecules, 1986