Back-surface emitting GaAsxSb1−x LED’s (λ=1.0 μm) prepared by molecular-beam epitaxy

Abstract
Compositionally graded layers of GaAsxSb1−x have been grown on GaAs substrates by molecular‐beam epitaxy. Planar Zn‐diffused 50‐μm‐diam light‐emitting diodes have been prepared in GaAs0.9Sb0.1. The 1.0‐μm wavelength emission was taken out through the transparent GaAs substrate, and for a pulsed current of 100 mA, the external quantum efficiency was 0.1%.