Comparison of spectrophotometric and ellipsometric methods of measuring the thickness of anodic oxide films on tantalum
- 1 March 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 101 (1), 11-19
- https://doi.org/10.1016/0040-6090(83)90489-3
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- A Study of the Oxygen Growth Laws of Anodic Oxide Films on Aluminum and Tantalum Using Nuclear Microanalysis of O16 and O18Journal of the Electrochemical Society, 1971
- Ellipsometric Studies of Anodic Oxide Films Formed on Tantalum in Dilute Phosphoric AcidJournal of the Electrochemical Society, 1970
- Ellipsometer Study of Anodic Oxides Formed on Sputtered Tantalum and Tantalum–Aluminum Alloy FilmsJournal of Vacuum Science and Technology, 1969
- Ionic Conductivity, Dielectric Constant, and Optical Properties of Anodic Oxide Films on Two Types of Sputtered Tantalum FilmsJournal of Applied Physics, 1966
- An Ellipsometric Study of Steady-State High Field Ionic Conduction in Anodic Oxide Films on Tantalum, Niobium, and SiliconJournal of the Electrochemical Society, 1966
- A radiotracer study of the composition and properties of anodic oxide films on tantalum and niobiumElectrochimica Acta, 1965