Formation of chemical compounds by ion bombardment of thin transition metal films
- 16 January 1978
- journal article
- research article
- Published by Wiley in physica status solidi (a)
- Vol. 45 (1), 343-352
- https://doi.org/10.1002/pssa.2210450140
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Changes in the phase structure and formation of chemical compounds by ion implantation of tantalum thin filmsThin Solid Films, 1976
- Phase transformations at bombardment of thin films with ionsphysica status solidi (a), 1975
- Properties of superconducting weak links produced by ion implantationJournal of Vacuum Science and Technology, 1975
- Reactive ion bombardment of tantalum thin film resistorsThin Solid Films, 1973