One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
- 1 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4), 449-454
- https://doi.org/10.1016/0167-9317(94)90193-7
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Electron beam writing of continuous resist profiles for optical applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992