Photoluminescence characteristics of AlGaAs-GaAs single quantum wells grown by migration-enhanced epitaxy at 300 °C substrate temperature
- 8 June 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 50 (23), 1686-1687
- https://doi.org/10.1063/1.97768
Abstract
When Ga or Al atoms are evaporated on a clean GaAs surface in an As-free or a very low As pressure atmosphere, they are quite mobile and migrate very rapidly along the surface even at low temperatures. This characteristic is exploited for growing high-quality GaAs and AlGaAs layers at very low temperatures by alternately supplying Ga and/or Al atoms and As4 molecules to the GaAs substrate. Applying this method, AlGaAs-GaAs single quantum well structures with excellent photoluminescence characteristics are grown at 300 °C.Keywords
This publication has 5 references indexed in Scilit:
- Low-Temperature Growth of GaAs and AlAs-GaAs Quantum-Well Layers by Modified Molecular Beam EpitaxyJapanese Journal of Applied Physics, 1986
- Simultaneous Observation of RHEED Oscillation during GaAs MBE Growth with Modulated Electron BeamJapanese Journal of Applied Physics, 1986
- Reflection high-energy electron diffraction oscillations from vicinal surfaces—a new approach to surface diffusion measurementsApplied Physics Letters, 1985
- Damped oscillations in reflection high energy electron diffraction during GaAs MBEJournal of Vacuum Science & Technology B, 1983
- Dynamics of film growth of GaAs by MBE from Rheed observationsApplied Physics A, 1983