Poly (phenyl methacrylate-co-methacrylic acid) as a dry-etching durable positive electron resist
- 1 April 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 29 (4), 518-524
- https://doi.org/10.1109/t-ed.1982.20736