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Fast Etching Phenomenon of Plasma-Silicon Nitride Films over Substrate Steps
Home
Publications
Fast Etching Phenomenon of Plasma-Silicon Nitride Films over Substrate Steps
Fast Etching Phenomenon of Plasma-Silicon Nitride Films over Substrate Steps
AH
Atsushi Hiraiwa
Atsushi Hiraiwa
KM
Kiichiro Mukai
Kiichiro Mukai
SH
Seiki Harada
Seiki Harada
TY
Takeo Yoshimi
Takeo Yoshimi
SI
Satoru Itoh
Satoru Itoh
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1 January 1979
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 18
(1)
,
191-192
https://doi.org/10.1143/jjap.18.191
Abstract
No abstract available
Keywords
NITRIDE FILMS
FAST ETCHING
ETCHING PHENOMENON
PLASMA SILICON
SUBSTRATE STEPS
Cited by 1 article