Modelling of radio frequency plasmas in tetrafluoromethane (CF4): the gas phase physics and the role of negative ion detachment
- 14 September 1994
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 27 (9), 1878-1886
- https://doi.org/10.1088/0022-3727/27/9/011
Abstract
No abstract availableKeywords
This publication has 43 references indexed in Scilit:
- Radio-frequency glow discharges in methane gas: modelling of the gas-phase physics and chemistryJournal of Physics D: Applied Physics, 1994
- Two-dimensional, self-consistent, three-moment simulation of RF glow dischargeIEEE Transactions on Plasma Science, 1993
- Experimental and theoretical study of the CF4DC glow discharge positive columnJournal of Physics D: Applied Physics, 1993
- Continuum modeling of radio-frequency glow discharges. I. Theory and results for electropositive and electronegative gasesJournal of Applied Physics, 1992
- Erratum: ‘‘Measurement and analysis of radio frequency glow discharge electrical impedance and network power loss’’ [J. Vac. Sci. Technol. A 8, 916 (1990)]Journal of Vacuum Science & Technology A, 1992
- Ionization coefficients in selected gas mixtures of interest to particle detectorsJournal of Applied Physics, 1992
- Absolute partial and total electron-impact-ionization cross sections forfrom threshold up to 500 eVPhysical Review A, 1991
- Plasma processing in microelectronics manufacturingAIChE Journal, 1989
- Absolute densities of reaction products from plasma etching of quartzJournal of Vacuum Science & Technology A, 1985
- Negative Ions in a Glow Discharge of TetrafluoromethaneContributions to Plasma Physics, 1985