10 nm Si pillars fabricated using electron-beam lithography, reactive ion etching, and HF etching
- 1 November 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (6), 2524-2527
- https://doi.org/10.1116/1.586659