Rough silicon surfaces studied by optical methods
- 30 September 1974
- journal article
- Published by Elsevier in Surface Science
- Vol. 45 (1), 91-116
- https://doi.org/10.1016/0039-6028(74)90157-5
Abstract
No abstract availableKeywords
This publication has 34 references indexed in Scilit:
- Calculation of the ellipsometric parameters characterizing a randomly rough surface by means of the Stratton-Chu-Silver integralOptics Communications, 1973
- Cesium Adsorption on W: Ellipsometry, Auger Spectroscopy, and Surface Potential Difference StudiesJournal of Applied Physics, 1972
- Polarization Characteristics of Scattered Radiation from a Diffraction Grating by Ellipsometry with Application to Surface RoughnessPhysical Review B, 1972
- Ellipsometric Study of Ni–P Film SurfacesJournal of Applied Physics, 1972
- A simple scatter method for optical surface roughness and slope measurements. Roughness of polished fused silicaJournal of Physics E: Scientific Instruments, 1970
- Ellipsometry with rough surfaceOptics Communications, 1970
- Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate Optical Constants of Silicon*Journal of the Optical Society of America, 1969
- Influence des irrégularités de surface sur les propriétés optiques des couches mincesJournal de Physique, 1964
- Ellipsometric investigations of oxide films on Ga AsJournal de Physique, 1964
- Determination of the Properties of Films on Silicon by the Method of EllipsometryJournal of the Optical Society of America, 1962