Use of SU-8 photoresist for very high aspect ratio x-ray lithography
- 1 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4), 493-496
- https://doi.org/10.1016/s0167-9317(00)00363-4
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Negative photoresists for optical lithographyIBM Journal of Research and Development, 1997
- Micromachining applications of a high resolution ultrathick photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995