Early formation of chemical vapor deposition diamond films

Abstract

Nanometer‐size diamond particles formed on a silicon substrate by the hot‐filament chemical vapor deposition method were examined by a high‐resolution electron microscope. The particles developed well‐faceted cuboctahedral habits. Examination of their morphologies and microstructures provides a wealth of information on their crystal growth mechanism. The effect of the pretreatment of the substrate by diamondpowder, which has been known to enhance thin‐film growth, was found to be due to seeding by ‘‘diamond dust’’ on the substrate surface.