Contribution to ion implantation through a narrow slit at higher energies
- 28 February 1983
- journal article
- Published by Elsevier in Microelectronics Journal
- Vol. 14 (1), 15-20
- https://doi.org/10.1016/s0026-2692(83)80165-7
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Distribution of implanted ions under arbitrarily shaped mask edgesPhysica Status Solidi (a), 1977
- Theoretical Considerations on Lateral Spread of Implanted IonsJapanese Journal of Applied Physics, 1972