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Reduction of Substrate Heating during rf Sputtering
Home
Publications
Reduction of Substrate Heating during rf Sputtering
Reduction of Substrate Heating during rf Sputtering
LL
Lawrence T. Lamont
Lawrence T. Lamont
AL
Albert Lang
Albert Lang
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1 January 1970
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 7
(1)
,
198-200
https://doi.org/10.1116/1.1315794
Abstract
No abstract available
Keywords
RF SPUTTERING
HEATING DURING RF
REDUCTION OF SUBSTRATE HEATING
Cited by 10 articles