Gaseous Thermal Electron Reactions: Attachment to SF6 and C7F14

Abstract

The rates of attachment of thermal gaseous electrons to sulfur hexafluoride and perfluoromethylcyclohexane have been measured using a microwave cavity resonance technique. The measurements are compared to the results of recent electron‐beam work. The rate constants for attachment to SF₆ and C₇F₁₄ are, respectively, 3.1×10⁻⁷ and 9.8×10⁻⁸ cc/molecule·sec. The former rate constant decreases and the latter slightly increases as the electron temperature is raised.