Electronic Transport in Amorphous Silicon Films
- 24 August 1970
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 25 (8), 509-511
- https://doi.org/10.1103/physrevlett.25.509
Abstract
Drift mobility and conductivity measurements were made between 290 and 85°K on amorphous silicon specimens prepared by glow-discharge decomposition of silane. The results suggest that excess electrons drift in the extended states with a mobility of about 10 . At lower temperatures, phonon-assisted hopping occurs through localized states occupying a range of 0.2 eV below the extended states. Conductivity results also suggest hopping transport near the Fermi energy.
Keywords
This publication has 15 references indexed in Scilit:
- Properties of glow-discharge deposited amorphous germanium and siliconJournal of Non-Crystalline Solids, 1970
- Review of the theory of amorphous semiconductorsJournal of Non-Crystalline Solids, 1970
- Electronic structure and transport in covalent amorphous semiconducting alloysJournal of Non-Crystalline Solids, 1970
- Characteristic phenomena in amorphous semiconductorsJournal of Non-Crystalline Solids, 1970
- Simple Band Model for Amorphous Semiconducting AlloysPhysical Review Letters, 1969
- Conduction in non-crystalline materialsPhilosophical Magazine, 1969
- Conduction and switching in non-crystalline materialsContemporary Physics, 1969
- The Preparation and Properties of Amorphous SiliconJournal of the Electrochemical Society, 1969
- Electrical conduction in amorphous silicon and germaniumThin Solid Films, 1968
- Electrons in disordered structuresAdvances in Physics, 1967