Ion cluster beam deposition of phthalocyanine films
- 1 November 1992
- journal article
- molecular electronics
- Published by Taylor & Francis in International Journal of Electronics
- Vol. 73 (5), 1051-1053
- https://doi.org/10.1080/00207219208925766
Abstract
The ionized cluster beam technique was investigated as a method which could bridge the gap between evaporation and plasma polymerization in organic thin film deposition. The results achieved for copper phthalocyanine as a model material are reported.Keywords
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