Synchrotron radiation induced metal deposition on semiconductors: Mo(CO)6 on Si (111)
- 4 September 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (10), 1020-1022
- https://doi.org/10.1063/1.101722
Abstract
We found that unmonochromatized soft x‐ray synchrotron radiation stimulates the dissociation of molecular Mo(CO)6 adsorbed on silicon, producing a metallic overlayer. The process, which is interesting for potential applications, was studied using soft x‐ray photoemission spectroscopy.Keywords
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