Application of a high density inductively coupled plasma reactor to polysilicon etching

Publisher Website

1 July 1993

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology A

Vol. 11 (4), 1296-1300
https://doi.org/10.1116/1.578542

Abstract

No abstract available

Keywords

INDUCTIVE COUPLED PLASMA

Cited by 53 articles