X-ray lithography using a KrF laser-plasma source at hν ≈ 1 keV
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4), 287-292
- https://doi.org/10.1016/0167-9317(87)90051-7
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- X-ray conversion efficiency as a function of atomic number for 0.26-μm-laser–irradiated targetsPhysical Review A, 1986
- X-ray lithography using a KrF laser–plasma sourceApplied Optics, 1986
- Phase conjugation of KrF laser radiationOptics Letters, 1981
- Plasma x-ray emission produced by ruby lasers at 1012 W/cm2Journal of Applied Physics, 1978