Hysteresis effect in reactive sputtering: a problem of system stability
- 14 September 1986
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 19 (9), L187-L190
- https://doi.org/10.1088/0022-3727/19/9/004
Abstract
The hysteresis effect occurring in reactive sputtering is shown by pumping speed analysis to arise from loss in gettering throughput, consequent on reduction in target yield, without consequent rise in pumping throughput. Change in this balance due to higher pumping speed can result in stable conditions.Keywords
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