Stencil mask distortion control using nonsymmetric perforation rings
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 225-228
- https://doi.org/10.1016/s0167-9317(98)00051-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Analysis of stencil mask distortion in ion projection lithographyMicroelectronic Engineering, 1997
- Distortion analysis of stencil masks with stress-relief structuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995