A JEOL 100 CXII converted for use as an electron-beam lithography system

Abstract
A JEOL 100 CXII transmission electron microscope with a scanning attachment has been modified for electron‐beam writing. A fully software controllable scan generator has been developed which includes a facility for digital rotation, necessary since the modified stage cannot provide rotation. Goldpalladium dots have been fabricated on GaAs with dimensions down to 20 nm, and 60 nm pitch gratings with a 30 nm linewidth.