Laser-photoinduced etching of semiconductors and metals
- 15 August 1980
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 37 (4), 344-346
- https://doi.org/10.1063/1.91941
Abstract
Etched patterns with submicron resolution have been produced using laser‐induced photodissociation of dissolved and complexed halogens in liquid solution. Tentative mechanisms for this photoinduced dissociation process are presented.Keywords
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