Electronic level of interstitial hydrogen in GaAs
- 1 October 1990
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 65 (14), 1800-1803
- https://doi.org/10.1103/PhysRevLett.65.1800
Abstract
The carbon-hydrogen complex in GaAs is evidenced by its stretching local mode of vibration. It is shown that even though carbon and hydrogen are present, this complex is not formed in n-type material; it only appears in p-type material. This is explained by the necessity for hydrogen to be in the positive charge state for the carbon-hydrogen complexes to be formed. The corresponding hydrogen electronic level is shown to be located around 0.5 eV above the top of the valence band.Keywords
This publication has 13 references indexed in Scilit:
- Injection and drift of a positively charged hydrogen species in p-type GaAsApplied Physics Letters, 1990
- Boron neutralization and hydrogen diffusion in silicon subjected to low-energy hydrogen implantationApplied Physics A, 1989
- Hydrogen in Crystalline SemiconductorsAnnual Review of Materials Science, 1988
- Dopant-type effects on the diffusion of deuterium in GaAsPhysical Review B, 1987
- Hydrogen passivation of C acceptors in high-purity GaAsApplied Physics Letters, 1987
- Hydrogen in crystalline semiconductorsApplied Physics A, 1987
- Electric field dependence of hydrogen neutralization of shallow-acceptor impurities in single-crystal siliconApplied Physics Letters, 1985
- Field drift of the hydrogen-related, acceptor-neutralizing defect in diodes from hydrogenated siliconApplied Physics Letters, 1985
- Transition-metal impurities in III-V compoundsJournal of Physics C: Solid State Physics, 1985
- Hydrogen localization near boron in siliconApplied Physics Letters, 1985