Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques
- 31 October 2007
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 84 (9-10), 1886-1889
- https://doi.org/10.1016/j.mee.2007.04.041