Upper Limit to Landau Damping in Helicon Discharges
- 29 March 1999
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 82 (13), 2677-2680
- https://doi.org/10.1103/physrevlett.82.2677
Abstract
The uncommonly high rf absorption efficiency of helicon discharges has been thought to be caused by Landau damping of helicon waves and the concomitant acceleration of primary electrons. By constructing an energy analyzer that accounts for rf fluctuations in plasma potential, it is shown that Landau-accelerated electrons are too sparse to explain the ionization efficiency. Instead, rf absorption and ionization are found to be consistent with the mechanism of mode coupling to Trivelpiece-Gould modes at the plasma boundary.Keywords
This publication has 25 references indexed in Scilit:
- Multiple Electron Beams Generated by a Helicon Plasma DischargePhysical Review Letters, 1998
- Hot-Electron Production and Wave Structure in a Helicon Plasma SourcePhysical Review Letters, 1997
- Experiments and modeling of a helicon sourceJournal of Vacuum Science & Technology A, 1996
- An experimental study of breakdown in a pulsed Helicon plasmaPlasma Sources Science and Technology, 1995
- Electron beam pulses produced by helicon-wave excitationPhysics of Plasmas, 1995
- Plasma production in a toroidal heliac by helicon wavesPhysical Review Letters, 1991
- Observation of nonthermal electron tails in an rf excited argon magnetoplasmaPhysics of Fluids B: Plasma Physics, 1991
- Plasma ionization by helicon wavesPlasma Physics and Controlled Fusion, 1991
- Very efficient plasma generation by whistler waves near the lower hybrid frequencyPlasma Physics and Controlled Fusion, 1984
- Plasma production using a standing helicon wavePhysics Letters A, 1970