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Abstract: Etching in reactive plasmas
Home
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Abstract: Etching in reactive plasmas
Abstract: Etching in reactive plasmas
JC
J. W. Coburn
J. W. Coburn
HW
H. F. Winters
H. F. Winters
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1 November 1979
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 16
(6)
,
1613-1614
https://doi.org/10.1116/1.570254
Abstract
No abstract available
Cited by 9 articles