Specimen replication for electron microscopy using x rays and x-ray resist
- 1 March 1976
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (3), 1192-1193
- https://doi.org/10.1063/1.322704
Abstract
We point out the advantages of the use of x‐ray resist as the recording medium in contact x‐ray micrography, with subsequent viewing under the scanning electron microscope. Untreated specimens may be replicated with a resolution better than 100 nm. Photographs of latex spheres obtained by this technique are presented.Keywords
This publication has 1 reference indexed in Scilit:
- High-resolution pattern replication using soft X raysElectronics Letters, 1972