Thermal and plasma wave depth profiling in silicon
- 1 September 1985
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 47 (5), 498-500
- https://doi.org/10.1063/1.96105
Abstract
We describe a depth‐profiling concept using the critically damped plasma wave corresponding to the propagation of the free‐carrier plasma density generated by a modulated laser in a semiconductor.Keywords
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