Growth of Epitaxial ZnO Thin Films by Organometallic Chemical Vapor Deposition

Abstract
Organometallic chemical vapor deposition of on sapphire, using the reaction of diethylzinc with , , and oxidizing gas systems, has been studied. Epitaxial films have been achieved at temperatures of 400° and 730°C, respectively, in the first two systems. The films have been characterized using scanning electron microscopy (SEM), reflection electron diffraction (RED), and surface acoustic wave techniques.