Ion projection lithography process on dry resist
- 1 April 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 55 (1-4), 902-904
- https://doi.org/10.1016/0168-583x(91)96304-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Ion projection lithography machine IPLM-01: A new tool for sub-0.5-micron modification of materialsJournal of Vacuum Science & Technology B, 1986
- Dry development of resists exposed to low-energy focused gallium ion beamJournal of Applied Physics, 1984
- Ion beam lithographyNuclear Instruments and Methods in Physics Research, 1981