A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits
- 31 October 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 15 (1-4), 289-292
- https://doi.org/10.1016/0167-9317(91)90231-2
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- A Method for Area Saving Planar Isolation Oxides Using Oxidation Protected SidewallsJournal of the Electrochemical Society, 1980