Some impedance measurements of anodic films formed on tantalum and niobium in sulphuric acid
- 30 November 1963
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 8 (11), 847-855
- https://doi.org/10.1016/0013-4686(63)80053-5
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- A radio-tracer study of the composition of anodic filmsActa Metallurgica, 1963
- The structure of anodic films—I. An electron diffraction examination of the products of anodic oxidation on tantalum, niobium and zirconiumActa Metallurgica, 1963
- A PROPOSED STRUCTURE FOR ANNEALED ANODIC OXIDE FILMS OF TANTALUMCanadian Journal of Chemistry, 1962
- Steady-state kinetics of formation of anodic oxide films on tantalum in sulphuric acidProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1960
- The contribution of microfissures to the dielectric losses of anodic oxide films on tantalum and zirconium and their role in electrolytic rectificationTransactions of the Faraday Society, 1959
- The formation of anodic oxide films on tantalum in non-aqueous solutionsActa Metallurgica, 1954
- Die Funkenspannung der elektrolytischen VentilwirkungThe European Physical Journal A, 1935