The Hall Effect and Specific Resistance of Cathodically Deposited Films of Gold

Abstract

Hall coefficient for sputtered films of gold was determined for films varying in thickness from about 10 mμ to 80 mμ, and was found to be independent of the current (even though current densities up to ${10}^6$ amp./${\mathrm{cm}}^2$ were used), of the magnetic field (3 to 28 kilogauss), and of the thickness (computed from the surface density), and of previous treatment of the film, and to have the same value as for bulk metal, 643×${10}^{-6\mathrm{}}$. This is accurate to one per cent since the high current densities used gave e.m.fs. of over a milli-volt. The constancy of the coefficient agrees with the theory that the sputtered particles have individually the same properties as the bulk metal.