Preparation of MgO Thin Films by RF Magnetron Sputtering

Abstract

MgO thin films were prepared on Si(100) substrates by RF magnetron sputtering using a Mg, or MgO target. The preferred orientation of MgO thin films using a Mg target was transformed from a (200) plane to a (111) plane as a function of substrate temperature. The preferred orientation of MgO thin films using a MgO target was observed only in the (200) plane.