Theory of Interstitial Oxygen in Silicon and Germanium

Publisher Website

1 November 1995

journal article
Published by Trans Tech Publications, Ltd. in Materials Science Forum

Vol. 196-201, 103-108
https://doi.org/10.4028/www.scientific.net/msf.196-201.103

Abstract

No abstract available

Keywords

OXYGEN IN COVALENT SEMICONDUCTORS

All Related Versions

Version 1, 1995-09-20, ArXiv (Unconfirmed version)

Cited by 4 articles