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The design philosophy for a 200 kV industrial high current ion implanter
Home
Publications
The design philosophy for a 200 kV industrial high current ion implanter
The design philosophy for a 200 kV industrial high current ion implanter
DA
D. Aitken
D. Aitken
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15 December 1976
journal article
Published by
Elsevier
in
Nuclear Instruments and Methods
Vol. 139
,
125-134
https://doi.org/10.1016/0029-554x(76)90667-4
Abstract
No abstract available
Keywords
FIBRE OPTICS
HEAT DISSIPATION
SURFACES WITH TEMPERATURES
LIQUID NITROGEN
SILICON WAFERS
SPACE CHARGE
CURRENT ION IMPLANTER
HIGH CURRENT ION
INDUSTRIAL HIGH CURRENT
Cited by 14 articles