Thin-film adhesion changes induced by electron irradiation
- 15 January 1984
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 44 (2), 193-195
- https://doi.org/10.1063/1.94705
Abstract
The adhesion of thin films of gold, sputter deposited onto silicon, is shown to be improved by subsequent irradiation with 5–30-keV electrons. The similarities between electron and heavy ion irradiation effects suggest a common (electronic) origin for the change in interfacial bonding.Keywords
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