Fabrication of ultrasmall Nb-AlOx-Nb Josephson tunnel junctions
- 6 August 1990
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 57 (6), 629-631
- https://doi.org/10.1063/1.103618
Abstract
We describe a fabrication process to make Nb‐AlOx‐Nb edge junctions with areas as small as 0.0022 μm2 and with current densities from 10 to 24 000 A/cm2. The junction conductance was low for voltages below the superconducting energy gap which indicates good quality tunnel barriers. Coulomb gap measurements obtained when the junctions were in the normal state were used to find the junction capacitance. Junction capacitance as small as 0.18 fF has been measured.Keywords
This publication has 9 references indexed in Scilit:
- Classical phase diffusion in small hysteretic Josephson junctionsPhysical Review Letters, 1989
- A submicrometer Nb/AlOx/Nb Josephson junctionJournal of Applied Physics, 1988
- Charging energy and phase delocalization in single very small Josephson tunnel junctionsPhysical Review Letters, 1987
- Observation of single-electron charging effects in small tunnel junctionsPhysical Review Letters, 1987
- Low-frequency excess noise in Nb-Al2O3-Nb Josephson tunnel junctionsApplied Physics Letters, 1987
- Current-voltage characteristics of nanoampere Josephson junctionsIEEE Transactions on Magnetics, 1987
- Coulomb blockade of single-electron tunneling, and coherent oscillations in small tunnel junctionsJournal of Low Temperature Physics, 1986
- Preparation and characteristics of Nb/Al-oxide-Nb tunnel junctionsJournal of Applied Physics, 1985
- High quality refractory Josephson tunnel junctions utilizing thin aluminum layersApplied Physics Letters, 1983